The Preciomo Udx? MOCVD system is engineered for high-volume Micro-LED manufacturing. Configurable with two independently controllable reactors, the system can accommodate up to 18x6" or 12x8" GaN-based Micro-LED epitaxial growth simultaneously. The dual-rotation wafer carrier with horizontal gas flow architecture ensures exceptional wavelength uniformity and production stability. Integrated IC industry standard EFEM and SMIF systems, achieving fully automated cassette-to-cassette wafer transfer and effectively reducing particle generation. Relying on its superior wavelength uniformity,low defect density and high production stability, the Preciomo Udx? MOCVD system fulfills the strict technical requirements and facilitates the Micro-LED mass production.
MOCVD solution for GaN based Micro-LED production
Key equipment for GaN-based Micro-LED production
Multi-wafer reactor with horizontal gas flow, 6"/8"compatible
Compact footprint with friendly maintenance
Model-based temperature control
Automatic transfer system compliant with IC industry standard
Industry-leading throughput
Exceptional wavelength and thickness uniformity with low defect density
Fully automated cassette-to-cassette transferring with high efficiency
User friendly software interface for intuitive operation
Customization and factory automation (FA) available
